DocumentCode :
1362363
Title :
New antiferromagnetic RuRhMn film and its application for spin-valves
Author :
Araki, Shunsuke ; Omata, E. ; Sano, Makoto ; Noguchi, Keisuke ; Morita, Hiroyuki ; Matsuzaki, M.
Author_Institution :
Data Storage Components Bus. Group, TDK Corp., Nagano
Volume :
34
Issue :
2
fYear :
1998
fDate :
3/1/1998 12:00:00 AM
Firstpage :
387
Lastpage :
389
Abstract :
We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit nm, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and is much better than that of FeMn films
Keywords :
antiferromagnetic materials; giant magnetoresistance; hard discs; magnetic anisotropy; magnetic heads; magnetic multilayers; magnetic thin films; manganese alloys; rhodium alloys; ruthenium alloys; thermal stability; 250 degC; GMR; MR ratio; RuRhMn; antiferromagnetic film; blocking temperature; corrosion resistance; hard disk drives; magnetoresistive heads; rest potential; spin-valves; thermal stability; unidirectional anisotropy; Anisotropic magnetoresistance; Antiferromagnetic materials; Glass; Magnetic anisotropy; Magnetic field measurement; Magnetic heads; Perpendicular magnetic anisotropy; Temperature; Thermal resistance; Thermal stability;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.667771
Filename :
667771
Link To Document :
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