• DocumentCode
    136241
  • Title

    Fabrication of low dark-count PureB single-photon avalanche diodes

  • Author

    Lin Qi ; Mok, K.R.C. ; Aminian, M. ; Charbon, E. ; Nanver, Lis K.

  • Author_Institution
    Delft Univ. of Technol., Delft, Netherlands
  • fYear
    2014
  • fDate
    1-5 Sept. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Single-photon avalanche diodes (SPADs) have been fabricated in Si by using PureB (Pure Boron) chemical-vapor deposition (CVD) to create both a nanometer-thin anode junction and robust light-entrance window. The device is sensitive to low-penetration-depth radiation such as UV light and low-energy electrons. Ideal I-V characteristics are obtained for operation in Geiger mode, whereas biasing is well above the breakdown voltage. The dark count rate (DCR) can be as low as 5 Hz at room temperature for an active area of 7 μm2. An implicit guard ring as small as 0.5 μm wide is implemented using an n-enhancement implantation in the central region of the diode, thus achieving a high fill-factor.
  • Keywords
    anodes; avalanche photodiodes; boron; chemical vapour deposition; nanoelectronics; B; CVD; DCR; Geiger mode; I-V characteristics; SPADs; Si; UV light; chemical-vapor deposition; dark count rate; high fill-factor; implicit guard ring; low dark-count pureB single-photon avalanche diode fabrication; low-energy electrons; low-penetration-depth radiation; n-enhancement implantation; nanometer-thin anode junction; robust light-entrance window; temperature 293 K to 298 K; Boron; CMOS integrated circuits; Robustness; Tunneling; Avalanche breakdown; photodiode; pure boron chemical vapor deposition; single-photon avalanche diode (SPAD); ultrashallow junctions;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Technology and Devices (SBMicro), 2014 29th Symposium on
  • Conference_Location
    Aracaju
  • Type

    conf

  • DOI
    10.1109/SBMicro.2014.6940113
  • Filename
    6940113