Title : 
In-situ n & k phase compensation in an interferometric flying height tester
         
        
            Author : 
Womack, Kenneth H. ; Butler, Allan
         
        
            Author_Institution : 
Phase Metrics, San Diego, CA, USA
         
        
        
        
        
            fDate : 
3/1/1998 12:00:00 AM
         
        
        
        
            Abstract : 
Conventional multiwavelength flying height testers rely upon an external ellipsometer for measurement of the slider´s n and k. These values are used to correct the phase offset of the interferometric signal. Typically n and k measurements obtained from a sampling of 20 to 30 sliders are averaged and the results are used indefinitely in production testing. This approach to n and k phase correction may be adequate for high flying heights but it becomes less attractive as flying heights decrease and the correction becomes a large fraction of the nominal. In the new method described here phase offset is measured when a standard retract or rpm calibration is performed. Using the calibration data, an estimate is obtained of the absolute reflectivity of the slider. Next the value of the real part n of the complex index of the slider is inferred from an independent correlation of n to the slider reflectivity. Given these two numbers-the slider reflectivity R and the real part n of the index-the phase correction for flying height is calculated using a well-known relationship giving phase shift on reflection as a function of n and R
         
        
            Keywords : 
calibration; compensation; ellipsometry; height measurement; light interferometry; magnetic heads; production testing; reflectivity; refractive index measurement; calibration; ellipsometer; in-situ phase compensation; interferometric flying height tester; production testing; refractive index; slider reflectivity; Calibration; Coatings; Glass; Phase measurement; Production; Rails; Reflection; Reflectivity; Sampling methods; Testing;
         
        
        
            Journal_Title : 
Magnetics, IEEE Transactions on