• DocumentCode
    1363898
  • Title

    Porous Silicon Resonators for Improved Vapor Detection

  • Author

    Hwang, Yongha ; Gao, Feng ; Hong, Augustin J. ; Candler, Rob N.

  • Author_Institution
    Electr. Eng. Dept., Univ. of California at Los Angeles (UCLA), Los Angeles, CA, USA
  • Volume
    21
  • Issue
    1
  • fYear
    2012
  • Firstpage
    235
  • Lastpage
    242
  • Abstract
    This paper presents a microscale resonant sensor that has been fabricated with nanoscale pores for enhanced sensitivity to chemical vapors. By building resonators that are made of porous silicon, we take advantage of the increased area for molecular binding and improve the sensitivity of the resonators to the vapor concentration of interest. We present results for resonators whose surfaces are entirely porous silicon. We also examine the use of targeted regions of porosity to keep critical parts of the beam nonporous and mechanically stable while still maximizing surface area. Surface micromachining processes were used to fabricate the silicon resonator mass sensor, allowing nanostructured devices to be fabricated using only standard top-down processing techniques. We have demonstrated an improvement up to 261% and 165% in resonator sensitivity to isopropyl alcohol forfully porous resonators and partially porous resonators, respectively, as compared to nonporous silicon resonators. Combining this increased sensitivity with resonator quality factor suggests an improvement in minimum detectable resolution over the nonporous resonators by 41% and 56% for the fully porous and partially porous resonators, respectively.
  • Keywords
    micromachining; micromechanical resonators; nanostructured materials; porosity; porous semiconductors; chemical vapor; isopropyl alcohol; microscale resonant sensor; molecular binding; nanoscale pore; nanostructured device; porous silicon resonator; resonator quality factor; silicon resonator mass sensor; surface micromachining; vapor detection; Etching; Q factor; Resonant frequency; Sensitivity; Silicon; Young´s modulus; Chemical sensing; electroless metal-assisted etching; mechanical stability; microelectromechanical systems (MEMS) resonators; porous silicon; quality factor;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2011.2170819
  • Filename
    6062634