DocumentCode
1364107
Title
Diagnostic and monitoring tools of large scale Si-manufacturing: trace-analytical tools and techniques in Si-wafer manufacturing
Author
Fabry, Laszlo ; Köster, Ludwig ; Pahlke, Siegfried ; Kotz, Ludwig ; Hage, Jürgen
Author_Institution
Wacker Siltronic GmbH, Burghausen, Germany
Volume
9
Issue
3
fYear
1996
fDate
8/1/1996 12:00:00 AM
Firstpage
428
Lastpage
436
Abstract
In order to facilitate fast corrective actions, all process media, crucial process steps and intermediate product stages of wafering must be monitored by suitable analytical tools. The analyzes have to provide reliable, relevant and real-time results at justifiable economy. Preferably, they should be serviceable in on-line configuration under strict SPC conditions. The following chapters outline the performance of the few analytical techniques, that optimally satisfy these requirements
Keywords
chemical analysis; elemental semiconductors; semiconductor technology; silicon; SPC; Si; diagnostic tools; large scale silicon wafer manufacturing; monitoring tools; on-line configuration; trace analysis; Atomic force microscopy; Electron microscopy; Fourier transforms; Infrared spectra; Large-scale systems; Mass spectroscopy; Monitoring; Silicon; Surface topography; Tomography;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.536113
Filename
536113
Link To Document