• DocumentCode
    1364107
  • Title

    Diagnostic and monitoring tools of large scale Si-manufacturing: trace-analytical tools and techniques in Si-wafer manufacturing

  • Author

    Fabry, Laszlo ; Köster, Ludwig ; Pahlke, Siegfried ; Kotz, Ludwig ; Hage, Jürgen

  • Author_Institution
    Wacker Siltronic GmbH, Burghausen, Germany
  • Volume
    9
  • Issue
    3
  • fYear
    1996
  • fDate
    8/1/1996 12:00:00 AM
  • Firstpage
    428
  • Lastpage
    436
  • Abstract
    In order to facilitate fast corrective actions, all process media, crucial process steps and intermediate product stages of wafering must be monitored by suitable analytical tools. The analyzes have to provide reliable, relevant and real-time results at justifiable economy. Preferably, they should be serviceable in on-line configuration under strict SPC conditions. The following chapters outline the performance of the few analytical techniques, that optimally satisfy these requirements
  • Keywords
    chemical analysis; elemental semiconductors; semiconductor technology; silicon; SPC; Si; diagnostic tools; large scale silicon wafer manufacturing; monitoring tools; on-line configuration; trace analysis; Atomic force microscopy; Electron microscopy; Fourier transforms; Infrared spectra; Large-scale systems; Mass spectroscopy; Monitoring; Silicon; Surface topography; Tomography;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.536113
  • Filename
    536113