• DocumentCode
    1364854
  • Title

    One-Time-Programmable Memory in LTPS TFT Technology With Metal-Induced Lateral Crystallization

  • Author

    Li, Lin ; Chui, Chi On ; He, Jin ; Chan, Mansun

  • Author_Institution
    Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
  • Volume
    59
  • Issue
    1
  • fYear
    2012
  • Firstpage
    145
  • Lastpage
    150
  • Abstract
    A simple and reliable one-time-programmable (OTP) memory for low-temperature polysilicon thin-film-transistor technology with metal-induced lateral crystallization (MILC) is developed. The antifuse memory element is based on the breakdown of thin silicon dioxide deposited on smooth surface achieved by MILC. The effects of crystallization process and electrode configurations on the memory characteristics, including statistical variations, are studied. A read current margin of 106 is achieved for the fresh and programmed memory element. Functional OTP memory array with compact layout and high disturb immunity using a split supply configuration is also demonstrated.
  • Keywords
    crystallisation; thin film transistors; LTPS TFT technology; MILC; antifuse memory element; low-temperature polysilicon thin-film-transistor technology; metal-induced lateral crystallization; one-time-programmable memory; Arrays; Educational institutions; Logic gates; Microprocessors; Thin film transistors; Antifuse; low-temperature polycrystalline silicon (LTPS); metal-induced lateral crystallization (MILC); nonvolatile memory (NVM); one-time programmable (OTP); thin-film transistor (TFT);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2171039
  • Filename
    6064881