DocumentCode
1364854
Title
One-Time-Programmable Memory in LTPS TFT Technology With Metal-Induced Lateral Crystallization
Author
Li, Lin ; Chui, Chi On ; He, Jin ; Chan, Mansun
Author_Institution
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Volume
59
Issue
1
fYear
2012
Firstpage
145
Lastpage
150
Abstract
A simple and reliable one-time-programmable (OTP) memory for low-temperature polysilicon thin-film-transistor technology with metal-induced lateral crystallization (MILC) is developed. The antifuse memory element is based on the breakdown of thin silicon dioxide deposited on smooth surface achieved by MILC. The effects of crystallization process and electrode configurations on the memory characteristics, including statistical variations, are studied. A read current margin of 106 is achieved for the fresh and programmed memory element. Functional OTP memory array with compact layout and high disturb immunity using a split supply configuration is also demonstrated.
Keywords
crystallisation; thin film transistors; LTPS TFT technology; MILC; antifuse memory element; low-temperature polysilicon thin-film-transistor technology; metal-induced lateral crystallization; one-time-programmable memory; Arrays; Educational institutions; Logic gates; Microprocessors; Thin film transistors; Antifuse; low-temperature polycrystalline silicon (LTPS); metal-induced lateral crystallization (MILC); nonvolatile memory (NVM); one-time programmable (OTP); thin-film transistor (TFT);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2171039
Filename
6064881
Link To Document