DocumentCode :
1364854
Title :
One-Time-Programmable Memory in LTPS TFT Technology With Metal-Induced Lateral Crystallization
Author :
Li, Lin ; Chui, Chi On ; He, Jin ; Chan, Mansun
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Volume :
59
Issue :
1
fYear :
2012
Firstpage :
145
Lastpage :
150
Abstract :
A simple and reliable one-time-programmable (OTP) memory for low-temperature polysilicon thin-film-transistor technology with metal-induced lateral crystallization (MILC) is developed. The antifuse memory element is based on the breakdown of thin silicon dioxide deposited on smooth surface achieved by MILC. The effects of crystallization process and electrode configurations on the memory characteristics, including statistical variations, are studied. A read current margin of 106 is achieved for the fresh and programmed memory element. Functional OTP memory array with compact layout and high disturb immunity using a split supply configuration is also demonstrated.
Keywords :
crystallisation; thin film transistors; LTPS TFT technology; MILC; antifuse memory element; low-temperature polysilicon thin-film-transistor technology; metal-induced lateral crystallization; one-time-programmable memory; Arrays; Educational institutions; Logic gates; Microprocessors; Thin film transistors; Antifuse; low-temperature polycrystalline silicon (LTPS); metal-induced lateral crystallization (MILC); nonvolatile memory (NVM); one-time programmable (OTP); thin-film transistor (TFT);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2171039
Filename :
6064881
Link To Document :
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