DocumentCode :
1366173
Title :
Variation in intrinsic parameters of transistor with gate width
Author :
Ariaudo, M. ; Bourdel, E. ; Pasquet, D.
Author_Institution :
ENSEA, EMO, Cergy Pontoise, France
Volume :
36
Issue :
15
fYear :
2000
fDate :
7/20/2000 12:00:00 AM
Firstpage :
1323
Lastpage :
1325
Abstract :
A method is developed that allows the intrinsic parameters of a transistor with a wide gate to be evaluated, taking the effects of propagation into account. It is shown that these parameters are not linearly related to the gate width. The proposed method provides a new transistor model that can be implemented in a circuit simulation
Keywords :
circuit simulation; field effect transistors; semiconductor device models; circuit simulation; gate width; intrinsic parameters; propagation effects; transistor model;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20000900
Filename :
856235
Link To Document :
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