• DocumentCode
    1366173
  • Title

    Variation in intrinsic parameters of transistor with gate width

  • Author

    Ariaudo, M. ; Bourdel, E. ; Pasquet, D.

  • Author_Institution
    ENSEA, EMO, Cergy Pontoise, France
  • Volume
    36
  • Issue
    15
  • fYear
    2000
  • fDate
    7/20/2000 12:00:00 AM
  • Firstpage
    1323
  • Lastpage
    1325
  • Abstract
    A method is developed that allows the intrinsic parameters of a transistor with a wide gate to be evaluated, taking the effects of propagation into account. It is shown that these parameters are not linearly related to the gate width. The proposed method provides a new transistor model that can be implemented in a circuit simulation
  • Keywords
    circuit simulation; field effect transistors; semiconductor device models; circuit simulation; gate width; intrinsic parameters; propagation effects; transistor model;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20000900
  • Filename
    856235