DocumentCode
1366548
Title
An Analytical Model for the Transfer Characteristics of a Polycrystalline Silicon Thin-Film Transistor With a Double Exponential Grain-Boundary Trap-State Energy Dispersion
Author
Chow, Thomas ; Wong, Man
Author_Institution
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Volume
30
Issue
10
fYear
2009
Firstpage
1072
Lastpage
1074
Abstract
For a thin-film transistor (TFT) built on excimer-laser crystallized polycrystalline silicon, the dependence of the effective ldquograin-boundary mobilityrdquo on the gate-to-source voltage can be divided into two subregimes exhibiting different power-law characteristics. An expression for the effective mobility is developed using a procedure previously proposed for a TFT built on polycrystalline silicon exhibiting only single power-law dependence. The additional power-law component is reflected in the model by a pair of measurable and physically meaningful parameters. The procedure for determining these parameters is described and demonstrated. Both the measured and calculated transfer characteristics are reported and compared. The double power-law dependence implies a grain-boundary trap-state energy dispersion characterized by two exponential functions. This is presently verified.
Keywords
elemental semiconductors; excimer lasers; grain boundaries; silicon; thin film transistors; Si; double exponential grain-boundary trap-state energy dispersion; excimer-laser crystallized polycrystalline silicon; gate-to-source voltage; polycrystalline silicon thin-film transistor; power-law characteristics; single power-law dependence; Analytical model; discrete; grain boundary; polycrystalline silicon; thin-film transistor (TFT); transfer characteristics; transition voltage; trap states;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2029352
Filename
5235114
Link To Document