DocumentCode :
1366548
Title :
An Analytical Model for the Transfer Characteristics of a Polycrystalline Silicon Thin-Film Transistor With a Double Exponential Grain-Boundary Trap-State Energy Dispersion
Author :
Chow, Thomas ; Wong, Man
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Volume :
30
Issue :
10
fYear :
2009
Firstpage :
1072
Lastpage :
1074
Abstract :
For a thin-film transistor (TFT) built on excimer-laser crystallized polycrystalline silicon, the dependence of the effective ldquograin-boundary mobilityrdquo on the gate-to-source voltage can be divided into two subregimes exhibiting different power-law characteristics. An expression for the effective mobility is developed using a procedure previously proposed for a TFT built on polycrystalline silicon exhibiting only single power-law dependence. The additional power-law component is reflected in the model by a pair of measurable and physically meaningful parameters. The procedure for determining these parameters is described and demonstrated. Both the measured and calculated transfer characteristics are reported and compared. The double power-law dependence implies a grain-boundary trap-state energy dispersion characterized by two exponential functions. This is presently verified.
Keywords :
elemental semiconductors; excimer lasers; grain boundaries; silicon; thin film transistors; Si; double exponential grain-boundary trap-state energy dispersion; excimer-laser crystallized polycrystalline silicon; gate-to-source voltage; polycrystalline silicon thin-film transistor; power-law characteristics; single power-law dependence; Analytical model; discrete; grain boundary; polycrystalline silicon; thin-film transistor (TFT); transfer characteristics; transition voltage; trap states;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2029352
Filename :
5235114
Link To Document :
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