DocumentCode :
1366691
Title :
Radiation tolerance of npn bipolar technology with 30 GHz Ft
Author :
Flament, O. ; Synold, S. ; de Pontcharra, J. ; Nie, S.
Author_Institution :
CEA, Centre d´´Etudes de Bruyeres-le-Chatel, France
Volume :
47
Issue :
3
fYear :
2000
fDate :
6/1/2000 12:00:00 AM
Firstpage :
654
Lastpage :
658
Abstract :
The tolerance to both ionizing dose and displacement damage of a Quasi-Self Aligned (QSA) single polysilicon emitter bipolar technology fabricated with a 0.35 μm design rule CMOS is presented. In this work we explore the effect of dose rate, high dose level irradiation and elevated temperature irradiation on the electrical performance of single polysilicon bipolar transistors. The different results are discussed and comparison with previous results are presented to place the technology with respect to others
Keywords :
BiCMOS integrated circuits; elemental semiconductors; radiation hardening (electronics); silicon; 0.35 micron; 30 GHz; BiCMOS; Si; design rule; displacement damage; dose rate; electrical performance; elevated temperature irradiation; ionizing dose; npn bipolar technology; quasi-self aligned single polysilicon emitter; radiation tolerance; BiCMOS integrated circuits; Bipolar transistors; CMOS technology; Degradation; Doping; Frequency; Germanium silicon alloys; Ionizing radiation; Silicon germanium; Temperature;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.856494
Filename :
856494
Link To Document :
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