Title :
Long-phase error-free fiber Bragg gratings
Author :
Komukai, T. ; Nakazawa, M.
Author_Institution :
NTT Opt. Network Syst. Labs., Ibaraki, Japan
fDate :
5/1/1998 12:00:00 AM
Abstract :
Stitching errors in the phase mask degrade the spectral response of fiber Bragg gratings fabricated with the phase mask technique. We successfully fabricated a stitching error-free phase mask and applied it to the fabrication of fiber Bragg gratings (FBGs). The gratings have no observable excess sidelobes in the reflectivity and show excellent wavelength selectivity.
Keywords :
diffraction gratings; errors; masks; optical communication equipment; optical fibre fabrication; optical fibre filters; reflectivity; WDM optical communications equipment; long-phase error-free fiber Bragg grating fabrication; phase mask; phase mask technique; reflectivity; spectal filter; spectral response; stitching error-free phase mask; stitching errors; wavelength selectivity; Bragg gratings; Chromium; Degradation; Fiber gratings; Lithography; Optical device fabrication; Resists; Silicon compounds; Substrates; Writing;
Journal_Title :
Photonics Technology Letters, IEEE