DocumentCode :
1368177
Title :
Modeling the pressure dependence of DC bias voltage in asymmetric, capacitive RF sheaths
Author :
Chandhok, Manish ; Grizzle, Jessy W.
Author_Institution :
Intel Corp., Hillsboro, OR, USA
Volume :
26
Issue :
2
fYear :
1998
fDate :
4/1/1998 12:00:00 AM
Firstpage :
181
Lastpage :
189
Abstract :
A semianalytical model for capacitively coupled radio frequency (RF) sheaths of asymmetric (unequal electrode area) systems has been developed. It can be applied in the high-frequency (ω > ω pi) regime at different pressures. An analytical approximation to the pressure-dependent ion density profile is used. The time-varying electric field and potential within the sheath are obtained by solving Poisson´s equation. The current balance and zero net DC current conditions are applied to solve for the RF sheath parameters and DC bias voltage. The DC voltage ratio between the powered and grounded electrode sheaths increases as the pressure decreases, which results in a larger DC bias voltage at lower pressures
Keywords :
ion density; plasma density; plasma sheaths; DC bias voltage; Poisson´s equation; analytical approximation; asymmetric capacitive RF sheaths; asymmetric unequal electrode area systems; current balance; electrode sheaths; modeling; potential; pressure dependence; pressure-dependent ion density profile; semianalytical model; time-varying electric field; zero net DC current conditions; Electrodes; Electrons; Plasma applications; Plasma density; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma temperature; Radio frequency; Voltage;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.669625
Filename :
669625
Link To Document :
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