Title :
Fabrication of a silicon-based superfluid oscillator
Author :
Schwab, Keith ; Steinhauer, J. ; Davis, J.C. ; Packard, Richard E.
Author_Institution :
Dept. of Phys., California Univ., Berkeley, CA, USA
fDate :
9/1/1996 12:00:00 AM
Abstract :
We have constructed an integrated superfluid oscillator using various silicon processing techniques, including micromachining and electron beam lithography. This device has the advantage of a very small internal volume (0.72 mm3). This makes it insensitive to spurious external acoustic noise which has limited the performance of larger experiments. We have tested the performance of this device in two configurations, one with a single micro-aperture and another with an additional fine tube. Both configurations demonstrate macroscopic quantum phenomena in superfluid 4He at low temperatures (0.25 K<T<2.2 K) and have been used to study these effects in detail
Keywords :
acoustic noise; cryogenic electronics; electron beam lithography; elemental semiconductors; micromachining; micromechanical resonators; oscillators; semiconductor technology; silicon; superfluid helium-4; 0.25 to 2.2 K; He; Helmholtz oscillator; Si; electron beam lithography; internal volume; macroscopic quantum phenomena; micromachining; single micro-aperture; spurious external acoustic noise; superfluid oscillator; Acoustic noise; Acoustic testing; Electron beams; Fabrication; Helium; Lithography; Micromachining; Oscillators; Silicon; Temperature;
Journal_Title :
Microelectromechanical Systems, Journal of
