• DocumentCode
    1368863
  • Title

    A new method for treating fluorine wastewater to reduce sludge and running costs

  • Author

    Toyoda, Arata ; Taira, Tsutomu

  • Author_Institution
    NEC Corp., Kawasaki, Japan
  • Volume
    13
  • Issue
    3
  • fYear
    2000
  • fDate
    8/1/2000 12:00:00 AM
  • Firstpage
    305
  • Lastpage
    309
  • Abstract
    Reduction of the sludge generated in fluorine wastewater treatment is a critical problem for the semiconductor industry. We have developed a new method for treating fluorine wastewater in order to reduce sludge and running costs. This method utilizes a small amount of Al(OH)3 not only as an aggregator for CaF2 generated from fluoride ions in the wastewater but also as an effective fluorine adsorbent. The Al(OH)3 as fluorine adsorbent is used repeatedly through an AI(OH)3 reclamation process. This method can effectively treat the concentrated fluorine wastewater to achieve an exceedingly low concentration in one-step treatment. We constructed a practical treatment system using this method by modifying part of an existing conventional system. This new treatment system is able to reduce both the total sludge and running costs to about one-tenth those of a conventional system
  • Keywords
    fluorine; integrated circuit economics; water pollution control; water treatment; Al(OH)3; CaF2; adsorbent; aggregator; one-step treatment; reclamation process; running costs; semiconductor industry; sludge; wastewater treatment; Calcium; Capacitance; Costs; Electronics industry; Industrial waste; Manufacturing processes; National electric code; Semiconductor materials; Sludge treatment; Wastewater treatment;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.857940
  • Filename
    857940