DocumentCode :
1370190
Title :
A 32 nm High-k Metal Gate SRAM With Adaptive Dynamic Stability Enhancement for Low-Voltage Operation
Author :
Kolar, Pramod ; Karl, Eric ; Bhattacharya, Uddalak ; Hamzaoglu, Fatih ; Nho, Henry ; Ng, Yong-Gee ; Wang, Yih ; Zhang, Kevin
Author_Institution :
Intel Corp., Hillsboro, OR, USA
Volume :
46
Issue :
1
fYear :
2011
Firstpage :
76
Lastpage :
84
Abstract :
SRAM bitcell design margin continues to shrink due to random and systematic process variation in scaled technologies and conventional SRAM faces a challenge in realizing the power and density benefits of technology scaling. Smart and adaptive assist circuits can improve design margins while satisfying SRAM power and performance requirements in scaled technologies. This paper introduces an adaptive, dynamic SRAM word-line under-drive (ADWLUD) scheme that uses a bitcell-based sensor to dynamically optimize the strength of WLUD for each die. The ADWLUD sensor enables 130 mV reduction in SRAM Vccmin while increasing frequency yield by 9% over conventional SRAM without WLUD. The sensor area overhead is limited to 0.02% and power overhead is 2% for a 3.4 Mb SRAM array.
Keywords :
CMOS memory circuits; SRAM chips; low-power electronics; CMOS memory circuits; SRAM array; SRAM bitcell design; SRAM power; adaptive SRAM word-line under-drive scheme; adaptive dynamic stability enhancement; bitcell-based sensor; dynamic SRAM word-line under-drive scheme; low voltage operation; metal gate SRAM; power overhead; scaled technology; size 32 nm; technology scaling; Circuit stability; Random access memory; Silicon; Temperature distribution; Temperature measurement; Temperature sensors; Transistors; 32 nm; CMOS memory integrated circuits; Vccmin; high-k+metal-gate; process variations; read assist; sram sensors; static random-access memory (SRAM); systematic variation; word-line under-drive;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2010.2084490
Filename :
5621844
Link To Document :
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