• DocumentCode
    1370531
  • Title

    Impact of extrinsic and intrinsic parameter fluctuations on CMOS circuit performance

  • Author

    Bowman, Keith A. ; Tang, Xinghai ; Eble, John C. ; Menldl, J.D.

  • Author_Institution
    Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • Volume
    35
  • Issue
    8
  • fYear
    2000
  • Firstpage
    1186
  • Lastpage
    1193
  • Abstract
    The yield of CMOS logic circuits satisfying a specific high performance requirement is demonstrated to be significantly influenced by the magnitude of critical-path delay deviations due to both extrinsic and intrinsic parameter fluctuations. To evaluate the impact of these parameter fluctuations, a static CMOS critical-path delay distribution is calculated from rigorously derived device and circuit models that enable projections for future technology generations. Two possible options are explored to attain a desired yield: (1) reduce performance by operating at a lower clock frequency; and (2) increase the supply voltage and, consequently, power dissipation, to satisfy the nominal critical-path delay. For the 50-nm technology generation, the delay and power dissipation increases are 12%-29% and 22%-6%, respectively, for extrinsic parameter standard deviations ranging from (a) 5% for effective channel length and 0% for gate oxide thickness and channel doping concentration to (b) 10% for effective channel length and 5% for gate oxide thickness and channel doping concentration. Combining both extrinsic and intrinsic fluctuations, the delay and power dissipation increase to 18%-32% and 31%-53%, respectively, thus demonstrating the significance of including the random dopant placement effect in future CMOS logic designs.
  • Keywords
    CMOS logic circuits; clocks; delays; doping profiles; logic gates; network parameters; 50 nm; CMOS circuit performance; CMOS logic circuits; channel doping concentration; clock frequency; critical-path delay deviations; critical-path delay distribution; effective channel length; extrinsic parameter fluctuations; gate oxide thickness; intrinsic parameter fluctuations; power dissipation; random dopant placement effect; supply voltage; CMOS logic circuits; CMOS technology; Clocks; Delay effects; Doping; Fluctuations; Frequency; Power dissipation; Semiconductor device modeling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/4.859508
  • Filename
    859508