DocumentCode :
1371425
Title :
Low threshold quantum dot injection laser emitting at 1.9 μm
Author :
Ustinov, V.M. ; Zhukov, A.E. ; Egorov, A.Y. ; Kovsh, A.R. ; Zaitsev, S.V. ; Gordeev, N.Y. ; Kopchatov, V.I. ; Ledentsov, Nikolay N. ; Tsatsulnikov, A.F. ; Kopev, P.S. ; Alferov, Z.I. ; Ruvimov, S.S. ; Liliental-Weber, Z. ; Bimberg, Dieter
Author_Institution :
A.F. Ioffe Physicotech. Inst., Acad. of Sci., St. Petersburg
Volume :
34
Issue :
7
fYear :
1998
fDate :
4/2/1998 12:00:00 AM
Firstpage :
670
Lastpage :
672
Abstract :
Self-organised InAs quantum dots inserted in an (In,Ga)As matrix lattice matched to an InP substrate are used as an active region in the injection laser. Low threshold (11.4 A/cm2) lasing at 1.894 μm (77 K) via the states of the quantum dots is obtained. A material gain of the order of 104 cm-1 is estimated
Keywords :
III-V semiconductors; indium compounds; quantum well lasers; semiconductor quantum dots; (In,Ga)As matrix; 1.9 micron; InAs-InGaAs; InP; InP substrate; injection laser; lattice matching; material gain; self-organised InAs quantum dot; threshold current density;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19980373
Filename :
673791
Link To Document :
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