• DocumentCode
    1371852
  • Title

    Mechanisms of Interface Trap Buildup and Annealing During Elevated Temperature Irradiation

  • Author

    Hughart, D.R. ; Schrimpf, R.D. ; Fleetwood, D.M. ; Tuttle, B.R. ; Pantelides, S.T.

  • Author_Institution
    Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
  • Volume
    58
  • Issue
    6
  • fYear
    2011
  • Firstpage
    2930
  • Lastpage
    2936
  • Abstract
    Both enhanced interface trap buildup and interface trap annealing can occur during elevated temperature irradiation (ETI), depending on the temperature, total dose, and dose rate. In this paper we describe mechanisms that govern the rate-limiting processes of interface trap buildup and annealing during ETI. Hydrogenated oxygen vacancies can facilitate hydrogen dimerization at elevated temperatures. This results in the removal of protons that can create interface traps, so degradation is suppressed. Hydrogen dimerization becomes more competitive with degradation mechanisms as the concentration of protons near the interface increases and/or as temperature increases.
  • Keywords
    annealing; interface states; proton effects; radiation hardening; vacancies (crystal); annealing mechanisms; degradation mechanisms; dose rate; elevated temperature irradiation; hydrogen dimerization; hydrogenated oxygen vacancies; interface trap annealing; interface trap buildup mechanisms; proton concentration; proton removal; rate-limiting processes; total dose; Annealing; Degradation; Hydrogen; Protons; Radiation effects; Temperature dependence; Annealing; elevated temperature irradiation; hardness assurance; hydrogen; interface traps; radiation effects;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2011.2171364
  • Filename
    6072293