DocumentCode
1371852
Title
Mechanisms of Interface Trap Buildup and Annealing During Elevated Temperature Irradiation
Author
Hughart, D.R. ; Schrimpf, R.D. ; Fleetwood, D.M. ; Tuttle, B.R. ; Pantelides, S.T.
Author_Institution
Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
Volume
58
Issue
6
fYear
2011
Firstpage
2930
Lastpage
2936
Abstract
Both enhanced interface trap buildup and interface trap annealing can occur during elevated temperature irradiation (ETI), depending on the temperature, total dose, and dose rate. In this paper we describe mechanisms that govern the rate-limiting processes of interface trap buildup and annealing during ETI. Hydrogenated oxygen vacancies can facilitate hydrogen dimerization at elevated temperatures. This results in the removal of protons that can create interface traps, so degradation is suppressed. Hydrogen dimerization becomes more competitive with degradation mechanisms as the concentration of protons near the interface increases and/or as temperature increases.
Keywords
annealing; interface states; proton effects; radiation hardening; vacancies (crystal); annealing mechanisms; degradation mechanisms; dose rate; elevated temperature irradiation; hydrogen dimerization; hydrogenated oxygen vacancies; interface trap annealing; interface trap buildup mechanisms; proton concentration; proton removal; rate-limiting processes; total dose; Annealing; Degradation; Hydrogen; Protons; Radiation effects; Temperature dependence; Annealing; elevated temperature irradiation; hardness assurance; hydrogen; interface traps; radiation effects;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2011.2171364
Filename
6072293
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