DocumentCode :
1371852
Title :
Mechanisms of Interface Trap Buildup and Annealing During Elevated Temperature Irradiation
Author :
Hughart, D.R. ; Schrimpf, R.D. ; Fleetwood, D.M. ; Tuttle, B.R. ; Pantelides, S.T.
Author_Institution :
Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
Volume :
58
Issue :
6
fYear :
2011
Firstpage :
2930
Lastpage :
2936
Abstract :
Both enhanced interface trap buildup and interface trap annealing can occur during elevated temperature irradiation (ETI), depending on the temperature, total dose, and dose rate. In this paper we describe mechanisms that govern the rate-limiting processes of interface trap buildup and annealing during ETI. Hydrogenated oxygen vacancies can facilitate hydrogen dimerization at elevated temperatures. This results in the removal of protons that can create interface traps, so degradation is suppressed. Hydrogen dimerization becomes more competitive with degradation mechanisms as the concentration of protons near the interface increases and/or as temperature increases.
Keywords :
annealing; interface states; proton effects; radiation hardening; vacancies (crystal); annealing mechanisms; degradation mechanisms; dose rate; elevated temperature irradiation; hydrogen dimerization; hydrogenated oxygen vacancies; interface trap annealing; interface trap buildup mechanisms; proton concentration; proton removal; rate-limiting processes; total dose; Annealing; Degradation; Hydrogen; Protons; Radiation effects; Temperature dependence; Annealing; elevated temperature irradiation; hardness assurance; hydrogen; interface traps; radiation effects;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2011.2171364
Filename :
6072293
Link To Document :
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