Title :
Phase-sensitive vision technique for high accuracy position measurement of moving targets
Author :
Sandoz, Patrick ; Ravassard, Jean Christophe ; Dembélé, Sounkalo ; Janex, André
Author_Institution :
CNRS, Univ. de Franche-Comte, Besancon, France
fDate :
8/1/2000 12:00:00 AM
Abstract :
This paper presents a vision technique for position and displacement measurement of moving targets. An adapted phase reference pattern is fixed to the object to be controlled and allows the location of the object in the scene observed by a static camera with an accuracy better than 10-2 pixel. The phase reference pattern is scaled as a function of the desired field of observation and position accuracy. Then the system measurement performances can be chosen from the nanometer to the millimeter ranges (or even larger). Furthermore, the method is self calibrating in length, since the phase reference pattern includes its own length reference. Drifts in vision system magnification therefore do not affect the measurement accuracy. Applications can be used in different fields, for instance, the position control of masks and wafers in photolithography processes or the servo-control of micro-robots
Keywords :
computer vision; computerised instrumentation; displacement measurement; image processing; integrated circuit technology; micropositioning; photolithography; position control; position measurement; target tracking; wavelet transforms; adapted phase reference pattern; displacement measurement; drifts; high accuracy; machine vision; masks; micro-robots; moving targets; phase-sensitive vision; photolithography; position accuracy; position control; position measurement; self calibration; servo-control; static camera; vision system magnification; wafers; wavelet transforms; Cameras; Displacement measurement; Layout; Machine vision; Optical distortion; Optical interferometry; Position measurement; Strips; Wavelet analysis; Wavelet transforms;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on