DocumentCode
1374604
Title
In-well ambipolar diffusion in room-temperature InGaAsP multiple quantum wells
Author
Marshall, Dawn ; Miller, Alan ; Button, Chris C.
Author_Institution
Sch. of Phys. & Astron., Univ. of St. Andrews, UK
Volume
36
Issue
9
fYear
2000
Firstpage
1013
Lastpage
1015
Abstract
Three-pulse transient amplitude grating experiments were performed using picosecond pulses at 1.525 /spl mu/m on room-temperature InGaAsP multiple quantum wells using a periodically poled LiNbO/sub 3/ (PPLN) optical parametric oscillator. An ambipolar diffusion coefficient of 7.2 cm/sup 2//s was measured from the diffraction efficiency decay rates. We deduce the presence of alloy scattering or an increase in interface scattering when comparing these results with those of similar experiments on GaAs-AlGaAs multiple quantum wells.
Keywords
III-V semiconductors; diffraction gratings; gallium arsenide; gallium compounds; high-speed optical techniques; indium compounds; light scattering; optical parametric oscillators; semiconductor quantum wells; 1.525 mum; InGaAsP; InGaAsP multiple quantum wells; LiNbO/sub 3/; PPLN optical parametric oscillator; alloy scattering; ambipolar diffusion coefficient; diffraction efficiency decay rates; in-well ambipolar diffusion; periodically poled LiNbO/sub 3/ optical parametric oscillator; room-temperature; room-temperature InGaAsP multiple quantum wells; three-pulse transient amplitude grating; Absorption; Extraterrestrial measurements; Gratings; Nonlinear optics; Optical diffraction; Optical pulses; Optical scattering; Probes; Quantum well devices; Temperature;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.863952
Filename
863952
Link To Document