Title :
Sol-gel hybrid glass diffractive elements by direct electron-beam exposure
Author :
Rantala, J.T. ; Nordman, N. ; Nordman, O. ; Vähäkangas, J. ; Honkanen, S. ; Peyghambarian, N.
Author_Institution :
Opt. Sci. Center, Arizona Univ., Tucson, AZ, USA
fDate :
3/5/1998 12:00:00 AM
Abstract :
The authors propose and demonstrate direct electron-beam writing of surface relief diffractive elements into hybrid inorganic/organic sol-gel glass films. The etch depth and phase delay can be controlled by the electron dose. The potential applications include multi-phase-level diffractive elements and apodised planar waveguide gratings
Keywords :
diffraction gratings; electron beam lithography; etching; optical planar waveguides; sol-gel processing; waveguide components; apodised planar waveguide gratings; direct electron-beam exposure; electron-beam writing; etch depth; integrated optics; multi-phase-level diffractive elements; phase delay; sol-gel hybrid glass diffractive elements; surface relief diffractive elements;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19980368
