DocumentCode :
1374960
Title :
Understanding the Mechanisms of Degradation and Failure Observed in ESD Protection Devices Under System-Level Tests
Author :
Pan, Zhihao ; Holland, Steffen ; Schroeder, Dietmar ; Krautschneider, Wolfgang H.
Author_Institution :
NXP Semicond., Hamburg, Germany
Volume :
10
Issue :
2
fYear :
2010
fDate :
6/1/2010 12:00:00 AM
Firstpage :
187
Lastpage :
191
Abstract :
The behavior and the failure mechanism of a monolithic bidirectional ESD protection device under a system-level ESD pulse are investigated. The device is realized by two diffused vertical back-to-back connected diodes. When the bottom p-n junction is stressed with an 18-kV system-level pulse, the device exhibited the typical signature of second thermal breakdown. Surprisingly, no ESD damage could initially be observed by measuring the poststress leakage current, even when the ESD level was further increased to 30 kV. A degrading IV behavior was later found to be associated with the second thermal breakdown. Based on simulations, local crystal defects are proposed to explain the observed degradation of the IV behavior. It is shown that, in this case, leakage-current measurements alone fail to detect such ESD damage. Failure analysis of the device confirms the existence of the crystal damage.
Keywords :
crystal defects; electrostatic discharge; failure analysis; leakage currents; p-n junctions; semiconductor device breakdown; semiconductor device reliability; semiconductor device testing; semiconductor diodes; ESD damage; ESD level; behavior mechanism; crystal damage; degradation; diffused vertical back-to-back connected diodes; failure analysis; failure mechanism; leakage current; local crystal defect; monolithic bidirectional ESD protection device; p-n junction; system-level ESD pulse; system-level pulse; system-level test; thermal breakdown; voltage 18 kV; voltage 30 kV; Degradation; electrostatic discharges (ESDs);
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2009.2039573
Filename :
5372000
Link To Document :
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