Title :
High-linearity and small-chip AlGaAs/GaAs power HBTs for L-band personal digital cellular applications
Author :
Chang-Woo Kim ; Hayama, N. ; Goto, N. ; Honjo, K.
Author_Institution :
Device Res. Labs., NEC Corp., Ibaraki, Japan
fDate :
4/1/1997 12:00:00 AM
Abstract :
A high-linearity AlGaAs/GaAs power heterojunction bipolar transistor (HBT) is developed for personal digital cellular phones. For compact chip layout, thermal design was considered. To improve power performance, proton implantation, optimum alloy condition for collector electrodes, and multiple via holes were used. A 2400-μm2-emitter-area HBT fabricated on a 0.5×0.67 mm2 substrate exhibits adjacent channel leakage powers below -53 dBc for 0.95- and 1.5-GHz /spl pi//4-shifted QPSK modulated input signals at a low collector-emitter voltage of 3.4 V. The HBT produces a 31.7-dBm output power, 50% power-added efficiency, and 15-dB linear power gain at 0.95 GHz, and produced a 31.3-dBm output power, 52% power-added efficiency, and 11.5-dB linear power gain at 1.5 GHz. These results were achieved on about one-fifth of the substrate area of conventional GaAs FETs.
Keywords :
III-V semiconductors; UHF bipolar transistors; aluminium compounds; cellular radio; digital radio; gallium arsenide; heterojunction bipolar transistors; ion implantation; power bipolar transistors; 0.95 to 1.5 GHz; 11.5 to 15 dB; 3.4 V; 50 to 52 percent; AlGaAs-GaAs; L-band cellular applications; UHF; collector electrodes; compact chip layout; heterojunction bipolar transistor; high-linearity type; multiple via holes; optimum alloy condition; personal digital cellular phones; proton implantation; small-chip power HBT; thermal design; Cellular phones; Electrodes; Gain; Gallium arsenide; Heterojunction bipolar transistors; L-band; Low voltage; Power generation; Protons; Quadrature phase shift keying;
Journal_Title :
Electron Device Letters, IEEE