Title :
Hot-carrier degradation of p-MOSFET´s under analog operation
Author :
Thewes, Roland ; Brox, Martin ; Goser, Karl F. ; Weber, Werner
Author_Institution :
R&D, Siemens AG, Munich, Germany
fDate :
4/1/1997 12:00:00 AM
Abstract :
The hot-carrier degradation of p-MOSFET´s is investigated from the viewpoint of analog operation. We apply sensitive measurement methods to determine drain current, drain conductance, and transconductance in the saturation regime besides the commonly investigated parameters in the linear regime of operation. Those investigations are performed for different gate lengths in order to allow comparisons between the shortest channels used for digital and the long channels usually used for analog operation, it is found that the drain conductance important in many analog applications, does not show a channel length dependence for gate lengths above 1.5 times the minimum gate length. The stress time dependencies are determined predominantly finding logarithmic behaviors. These findings are explained by a model which highlights the importance of the lengths of the regions of damage and carrier velocity saturation. Moreover, the dependencies of the different characterization parameters on stress time, channel length and voltages of operation are evaluated. Finally, methods are given for extrapolation of degradation of analog parameters to operating conditions for reliability assurance
Keywords :
MOSFET; electric admittance; electric current; hot carriers; semiconductor device models; semiconductor device reliability; semiconductor device testing; I-V characteristics; analog operation; carrier velocity saturation; channel length dependence; damage regions; drain conductance; drain current; gate length dependence; hot-carrier degradation; linear regime; logarithmic behavior; model; p-MOSFET; reliability assurance; saturation regime; sensitive measurement methods; stress time dependencies; transconductance; Analog circuits; Current measurement; Degradation; Extrapolation; Hot carriers; Low voltage; MOSFET circuits; Research and development; Stress; Transconductance;
Journal_Title :
Electron Devices, IEEE Transactions on