DocumentCode :
1376800
Title :
Area-efficient layout design for CMOS output transistors
Author :
Ker, Ming-Dou ; Wu, Chung-Yu ; Wu, Tain-Shun
Author_Institution :
VLSI Design Dept., Ind. Technol. Res. Inst., Hsinchu, Taiwan
Volume :
44
Issue :
4
fYear :
1997
fDate :
4/1/1997 12:00:00 AM
Firstpage :
635
Lastpage :
645
Abstract :
A novel layout design to effectively reduce the layout area of the thin-oxide NMOS and PMOS devices in CMOS output buffers with ESD consideration is proposed. With respect to the traditional finger-type layout, the large-dimension output NMOS and PMOS devices are realized by multiple octagonal cells. Without using extra ESD-optimization process, the output NMOS and PMOS devices in this octagon-type layout can provide higher driving/sinking current and better ESD robustness within a smaller layout area. The drain-to-bulk parasitic capacitance at the output node is also reduced by this octagon-type layout. Experimental results in a 0.6-μm CMOS process have shown that the output driving (sinking) current of CMOS output buffers in per unit layout area is increased 47.7% (34.3%) by this octagon-type layout. The HBM (MM) ESD robustness of this octagon-type output buffer in per unit layout area is also increased 41.5% (84.6%), as comparing to the traditional finger-type output buffer. This octagon-type layout design makes a substantial contribution to the submicron or deep-submicron CMOS IC´s in high-density and high-speed applications
Keywords :
CMOS integrated circuits; MOSFET; electrostatic discharge; integrated circuit layout; integrated circuit measurement; integrated circuit reliability; 0.6 mum; CMOS output buffers; CMOS output transistors; ESD robustness; HBM robustness; area-efficient layout design; deep-submicron CMOS IC; drain-to-bulk parasitic capacitance; driving current; high-density high-speed applications; layout area reduction; multiple octagonal cells; sinking current; submicron CMOS IC; thin-oxide NMOS devices; thin-oxide PMOS devices; CMOS process; CMOS technology; Circuits; Degradation; Electrostatic discharge; Inverters; MOS devices; Parasitic capacitance; Protection; Robustness;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.563369
Filename :
563369
Link To Document :
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