• DocumentCode
    1376800
  • Title

    Area-efficient layout design for CMOS output transistors

  • Author

    Ker, Ming-Dou ; Wu, Chung-Yu ; Wu, Tain-Shun

  • Author_Institution
    VLSI Design Dept., Ind. Technol. Res. Inst., Hsinchu, Taiwan
  • Volume
    44
  • Issue
    4
  • fYear
    1997
  • fDate
    4/1/1997 12:00:00 AM
  • Firstpage
    635
  • Lastpage
    645
  • Abstract
    A novel layout design to effectively reduce the layout area of the thin-oxide NMOS and PMOS devices in CMOS output buffers with ESD consideration is proposed. With respect to the traditional finger-type layout, the large-dimension output NMOS and PMOS devices are realized by multiple octagonal cells. Without using extra ESD-optimization process, the output NMOS and PMOS devices in this octagon-type layout can provide higher driving/sinking current and better ESD robustness within a smaller layout area. The drain-to-bulk parasitic capacitance at the output node is also reduced by this octagon-type layout. Experimental results in a 0.6-μm CMOS process have shown that the output driving (sinking) current of CMOS output buffers in per unit layout area is increased 47.7% (34.3%) by this octagon-type layout. The HBM (MM) ESD robustness of this octagon-type output buffer in per unit layout area is also increased 41.5% (84.6%), as comparing to the traditional finger-type output buffer. This octagon-type layout design makes a substantial contribution to the submicron or deep-submicron CMOS IC´s in high-density and high-speed applications
  • Keywords
    CMOS integrated circuits; MOSFET; electrostatic discharge; integrated circuit layout; integrated circuit measurement; integrated circuit reliability; 0.6 mum; CMOS output buffers; CMOS output transistors; ESD robustness; HBM robustness; area-efficient layout design; deep-submicron CMOS IC; drain-to-bulk parasitic capacitance; driving current; high-density high-speed applications; layout area reduction; multiple octagonal cells; sinking current; submicron CMOS IC; thin-oxide NMOS devices; thin-oxide PMOS devices; CMOS process; CMOS technology; Circuits; Degradation; Electrostatic discharge; Inverters; MOS devices; Parasitic capacitance; Protection; Robustness;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.563369
  • Filename
    563369