DocumentCode
1378116
Title
High Characteristic Temperature of Highly Stacked Quantum-Dot Laser for 1.55-
m Band
Author
Akahane, Kouichi ; Yamamoto, Naokatsu ; Kawanishi, Tetsuya
Author_Institution
Nat. Inst. of Inf. & Commun. Technol., Koganei, Japan
Volume
22
Issue
2
fYear
2010
Firstpage
103
Lastpage
105
Abstract
We fabricated broad-area laser diodes comprising 30-layer stacks of InAs quantum dots (QDs) by using strain compensation. The devices exhibited ground-state lasing at 1529 nm in pulsed mode with a high characteristic temperature of 113 K around room temperature (20°C-80°C). Ground-state lasing was achieved because of the high QD density afforded by strain compensation.
Keywords
III-V semiconductors; ground states; indium compounds; laser modes; quantum dot lasers; InAs; broad-area laser diodes; ground-state lasing; high characteristic temperature laser; high quantum dot density; highly stacked quantum-dot laser; pulsed mode; strain compensation; temperature 113 K; temperature 20 °C to 80 °C; wavelength 1.55 μm; wavelength 1529 nm; Characteristic temperature; quantum dot (QD); stacking strain compensation;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2009.2035821
Filename
5373966
Link To Document