A micromachined 585 GHz Schottky mixer

Author

Hui, K. ; Hesler, J.L. ; Kurtz, D.S. ; Bishop, W.L. ; Crowe, T.W.

Author_Institution

Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA, USA

Volume

10

Issue

9

fYear

2000

Firstpage

374

Lastpage

376

Abstract

Standard semiconductor fabrication processes have been used to form waveguide components for the submillimeter wavelength range. A 585 GHz fundamentally pumped Schottky mixer with record performance demonstrates this technology. It consists of an etched silicon horn, a diced waveguide, and a lithographically formed microstrip channel for the diode circuit. The block dimensions are precisely controlled and extremely sharp. The measured mixer noise temperature is 1200 K (DSB), which is equivalent to the best result obtained with standard metal machining.

Keywords

Etching; Micromachining; Microstrip circuits; Schottky diode mixers; Submillimeter wave circuits; Submillimeter wave diodes; Submillimeter wave mixers; Ultraviolet lithography; 585 GHz; Si; diced waveguide; diode circuit; etched Si horn; fundamentally pumped mixer; lithographically formed microstrip channel; micromachined Schottky mixer; standard semiconductor fabrication processes; submillimeter wavelength range; waveguide component; Etching; Microstrip; Optical device fabrication; Semiconductor diodes; Semiconductor waveguides; Silicon; Submillimeter wave circuits; Submillimeter wave technology; Temperature measurement; Waveguide components;

fLanguage

English

Journal_Title

Microwave and Guided Wave Letters, IEEE

Publisher

ieee

ISSN

1051-8207

Type

jour

DOI

10.1109/75.867855

Filename

867855