DocumentCode :
1381771
Title :
An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance
Author :
Kovalgin, Alexey Y. ; Tiggelman, Natalie ; Wolters, Rob A M
Author_Institution :
MESA+ Inst. for Nanotechnol., Univ. of Twente, Enschede, Netherlands
Volume :
59
Issue :
2
fYear :
2012
Firstpage :
426
Lastpage :
432
Abstract :
The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.
Keywords :
contact resistance; resistors; actual current flow; area of contact; area-correction model; crossbridge Kelvin resistor; low specific contact resistance; low-resistivity metal-to-metal contact; measurement accuracy; minimum contact resistance; sheet resistance; specific contact resistance; specific contact resistance extraction; two-metal stack; Contact resistance; Geometry; Integrated circuits; Metals; Resistance; Resistors; Cross-bridge Kelvin resistor (CBKR); specific contact resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2174365
Filename :
6086605
Link To Document :
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