DocumentCode :
138245
Title :
Design for thermo-mechanical reliability of a 3D microelectronic component using 3D FEM
Author :
Belhenini, Soufyane ; Tougui, Abdellah ; Dosseul, Franck
Author_Institution :
Lab. de Mec. et Rheologie (LMR), Univ. de Tours., Tours, France
fYear :
2014
fDate :
7-9 April 2014
Firstpage :
1
Lastpage :
6
Abstract :
3D microelectronic components are exposed to electrical, thermal, mechanical and chemical stresses generated by storage, transport, manipulation, functioning and environment. The reliability of the components depends partially on the reliability of interconnections which insures the mechanical and the electrical junctions between components and printed circuits. Reliability has to be evaluated on mechanical demonstrators before the production stage. It is currently studied by employing standardized tests. Modeling has been proven to be a very efficient tool in IC Packaging reliability, especially for designing and optimization, compared with experimental standardized tests, which are expensive and time-consuming. In this work, the board level thermomechanical reliability of a 3D chip to wafer component was evaluated by using a coupled thermal-structural numerical analysis. 3D FEM results were employing in the design optimization of 3D components. The critical solder bump strain energy density is used as the principal reliability criteria. The influence of the internal architectures of 3D components and the TSVs locations on the thermomechanical reliability has been studied.
Keywords :
finite element analysis; integrated circuit interconnections; integrated circuit packaging; integrated circuit reliability; optimisation; printed circuits; solders; thermal stresses; thermomechanical treatment; 3D FEM; 3D chip; 3D microelectronic component; IC packaging reliability; board level; chemical stress; coupled thermal-structural numerical analysis; electrical junctions; electrical stress; energy density; interconnections; mechanical stress; optimization; printed circuits; solder bump strain; thermal stress; thermomechanical reliability; wafer component; Abstracts; Load modeling; Numerical models; Reliability; Solid modeling; Three-dimensional displays; Through-silicon vias; 3D integration; FEM calculations; microelectronic; reliability; thermal cycling test;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, mechanical and multi-physics simulation and experiments in microelectronics and microsystems (eurosime), 2014 15th international conference on
Conference_Location :
Ghent
Print_ISBN :
978-1-4799-4791-1
Type :
conf
DOI :
10.1109/EuroSimE.2014.6813881
Filename :
6813881
Link To Document :
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