DocumentCode
1382879
Title
Avalanche multiplication in GaInP/GaAs single heterojunction bipolar transistors
Author
Flitcroft, Richard M. ; David, John P R ; Houston, Peter A. ; Button, Christopher C.
Author_Institution
Dept. of Electron. & Electr. Eng., Sheffield Univ., UK
Volume
45
Issue
6
fYear
1998
fDate
6/1/1998 12:00:00 AM
Firstpage
1207
Lastpage
1212
Abstract
The electron multiplication factors in GaInP/GaAs single heterojunction bipolar transistors (HBT´s) have been measured as a function of base-collector bias for a range of GaAs collector doping densities. In the lowest doped (5×1014 cm-3) thick collector the multiplication is determined by the local electric field. As the collector doping increases, the measured multiplication is found to be significantly reduced at low values of multiplication from that predicted by the electric field profile. However, good agreement is always found at high multiplication, close to breakdown. This reduction in multiplication at low electric fields is attributed to the dead space, the minimum distance over which carriers must travel before gaining the ionization threshold energy. A simple correction for the dead space is proposed, allowing the multiplication to be accurately predicted even in heavily doped structures
Keywords
III-V semiconductors; avalanche breakdown; doping profiles; gallium arsenide; gallium compounds; heavily doped semiconductors; heterojunction bipolar transistors; impact ionisation; indium compounds; GaAs collector doping densities; GaInP-GaAs; GaInP/GaAs HBT; avalanche multiplication; base-collector bias; dead space correction; electric field profile; electron multiplication factors; heavily doped structures; ionization threshold energy; local electric field; single heterojunction bipolar transistors; Density measurement; Doping profiles; Electric breakdown; Electric variables measurement; Electrons; Gain measurement; Gallium arsenide; Heterojunction bipolar transistors; Ionization; Space exploration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.678515
Filename
678515
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