DocumentCode :
1383066
Title :
A novel self-aligned bidirectional MIM diode with transparent junctions for AM-LCD´s
Author :
Zhang, Shengdong ; Sin, Johnny K O
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong
Volume :
19
Issue :
6
fYear :
1998
fDate :
6/1/1998 12:00:00 AM
Firstpage :
192
Lastpage :
194
Abstract :
A novel self-aligned bidirectional Metal-Insulator-Metal (MIM) diode with transparent junctions is proposed and fabricated. The MIM diode is formed by a combination of Ta/TaO/sub x//ITO/TaO/sub x//Ta. In this structure, both symmetrical and shift-free I-V characteristics are obtained. The symmetrical I-V characteristics are attributed to the excellent symmetry in the diode structure. The significant reduction of the shift in the I-V characteristics is a result of the removal of the charges captured by the traps in the TaO/sub x/ layers and at the interfaces between the TaO, and the electrodes during electrical stress. Only three masks are needed for the fabrication of the MIM diode pixel, which is as simple as the conventional approach. Moreover, the adoption of the lateral junction approach in the structure makes it possible to be used for high density MIM matrix implementation over large area substrates without the need of high-resolution patterning techniques.
Keywords :
MIM devices; diodes; liquid crystal displays; metal-insulator boundaries; AM-LCD; I-V characteristics; Ta-TaO-ITO-TaO-Ta; Ta-TaO-InSnO-TaO-Ta; TaO/sub x/ layer traps; active matrix LCD; fabrication; high density MIM matrix implementation; large area substrates; lateral junction; self-aligned bidirectional MIM diode; transparent junctions; Diodes; Electrodes; Fabrication; Indium tin oxide; Liquid crystal displays; Metal-insulator structures; Silicon compounds; Stress; Substrates; Thin film transistors;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.678540
Filename :
678540
Link To Document :
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