DocumentCode
1383456
Title
New seed geometry for growth of low dislocation synthetic quartz
Author
Shinohara, Armando H. ; Iano, Marcos C. ; Suzuki, Carlos K.
Author_Institution
Dept. of Mech. Eng., Univ. Fed. de Pernambuco, Recife, Brazil
Volume
47
Issue
5
fYear
2000
Firstpage
1199
Lastpage
1203
Abstract
A method to grow low dislocation density synthetic quartz by using a special cutting seed geometry is reported. With this method, a relatively high dislocation density seed material is allowable. For such a purpose, a seed of new geometry was prepared and grown in a standard hydrothermal growth condition, long in Y-direction with multiple V-shaped notches made on Z-face. The characterization study was conducted by X-ray topography. The results showed new growth regions, equal to the numbers of V-shaped notches made in the seed and usually not found in the conventional Y- and Z-bar synthetic quartz crystals. Each new growth region is composed of two sectors of distinct textures. Soon they disappear due to their high growth velocity, and they are replaced by the so-called Z-region. However, the growth process of these new sectors grown perpendicular to the internal faces of the V-shaped notches played an important role in inhibiting the propagation of the dislocation originally present in the seed into the grown Z-region.
Keywords
X-ray topography; crystal growth from solution; dislocation density; quartz; SiO/sub 2/; X-ray topography; cutting seed geometry; dislocation density; hydrothermal growth; synthetic quartz crystal; Conducting materials; Crystalline materials; Crystallization; Crystals; Etching; Ferroelectric materials; Geometry; Mechanical engineering; Solids; Surfaces;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/58.869066
Filename
869066
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