DocumentCode :
1383870
Title :
Geometric Magnetoresistance Mobility Extraction in Highly Scaled Transistors
Author :
Campbell, J.P. ; Cheung, K.P. ; Yu, L.C. ; Suehle, J.S. ; Oates, A. ; Sheng, K.
Author_Institution :
Semicond. Electron. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume :
32
Issue :
1
fYear :
2011
Firstpage :
75
Lastpage :
77
Abstract :
Geometric magnetoresistance (gMR) provides a promising solution to the difficult challenges associated with channel mobility extraction in nanoscale transistors. However, this technique requires significant experimental considerations which are uncommon in most laboratories. In addition, removing the influence of series resistance on the extracted mobility introduces further difficulty. In this letter, we present a new gMR measurement methodology that not only greatly simplifies the experimental requirements but also yields mobility values which are free from series resistance effects.
Keywords :
magnetoresistance; transistors; channel mobility extraction; geometric magnetoresistance mobility extraction; highly scaled transistor; nanoscale transistor; series resistance effect; Current measurement; Electrical resistance measurement; MOSFET circuits; Magnetic separation; Magnetoresistance; Resistance; Semiconductor device measurement; Channel mobility; geometric magnetoresistance (gMR);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2086044
Filename :
5640639
Link To Document :
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