Title :
Geometric Magnetoresistance Mobility Extraction in Highly Scaled Transistors
Author :
Campbell, J.P. ; Cheung, K.P. ; Yu, L.C. ; Suehle, J.S. ; Oates, A. ; Sheng, K.
Author_Institution :
Semicond. Electron. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Abstract :
Geometric magnetoresistance (gMR) provides a promising solution to the difficult challenges associated with channel mobility extraction in nanoscale transistors. However, this technique requires significant experimental considerations which are uncommon in most laboratories. In addition, removing the influence of series resistance on the extracted mobility introduces further difficulty. In this letter, we present a new gMR measurement methodology that not only greatly simplifies the experimental requirements but also yields mobility values which are free from series resistance effects.
Keywords :
magnetoresistance; transistors; channel mobility extraction; geometric magnetoresistance mobility extraction; highly scaled transistor; nanoscale transistor; series resistance effect; Current measurement; Electrical resistance measurement; MOSFET circuits; Magnetic separation; Magnetoresistance; Resistance; Semiconductor device measurement; Channel mobility; geometric magnetoresistance (gMR);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2086044