DocumentCode :
1384017
Title :
Threshold Voltage Fluctuation by Random Telegraph Noise in Floating Gate nand Flash Memory String
Author :
Joe, Sung-Min ; Yi, Jeong-Hyong ; Park, Sung-Kye ; Shin, Hyungcheol ; Park, Byung-Gook ; Park, Young June ; Lee, Jong-Ho
Author_Institution :
Sch. of EECS Eng., Seoul Nat. Univ., Seoul, South Korea
Volume :
58
Issue :
1
fYear :
2011
Firstpage :
67
Lastpage :
73
Abstract :
Read current fluctuation (ΔIread) due to random telegraph noise was measured from a cell in a NAND flash memory cell string, and its effect on threshold voltage fluctuation (ΔVth) was analyzed. Sixteen-level fluctuation (four traps) was observed in a 60-nm cell of a cell string (ΔIread/Iread of ~0.4). ΔIread increased with decreasing Lg, and ΔIread/Iread up to 0.75 was observed at 48 nm. ΔIread, ΔVth, and their relation were clearly analyzed with program/erase mode of a cell and pass cells in a string. Although ΔIread is largest when a read cell and pass cells are erased, ΔVth is largest when a read cell is erased and pass cells are programmed in a cell string. We also observed the specific noise amplitude under various conditions, such as the bit-line bias, the pass bias of unselected cells in the NAND strings, and the temperature.
Keywords :
NAND circuits; flash memories; integrated circuit noise; random noise; bit-line bias; cell string; floating gate NAND flash memory string; noise amplitude; pass cells; program-erase mode; random telegraph noise; read cell; read current fluctuation; sixteen-level fluctuation; size 48 nm; size 60 nm; threshold voltage fluctuation; Ash; Current measurement; Flash memory; Logic gates; Noise; Resistance; Threshold voltage; Floating gate; multilevel RTS; nand flash memory; random telegraph noise (RTN); threshold voltage fluctuation; transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2088126
Filename :
5640663
Link To Document :
بازگشت