DocumentCode
1385086
Title
A microfabricated inductively coupled plasma generator
Author
Hopwood, J.A.
Author_Institution
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
Volume
9
Issue
3
fYear
2000
Firstpage
309
Lastpage
313
Abstract
The design, fabrication, and characterization of a surface micromachined plasma generator is described for the first time in this paper. The plasma is sustained without electrodes by inductively coupling a /spl sim/150-MHz current into a region of low-pressure gas, Both argon and air plasmas have been generated over a range of gas pressures from 0.1 to 10 torr (13.3-1333 Pa). Typically, the power used to sustain the plasma is 350 mW, although /spl sim/1.5 W is required to initiate the discharge. Network analysis of the plasma generator circuit shows that over 99% of the applied RF power can be absorbed by the device. Of this, /spl sim/50% is absorbed by the plasma and the remainder of the power is dissipated as ohmic heating. An argon ion current of up to 4.5 mA/cm/sup 2/ has been extracted from the plasma and the electron temperature is 52 000 K at 0.1 torr. This plasma source is intended for electronic excitation of gas samples so that the presence of impurities and toxins may be detected using optical emission spectroscopy.
Keywords
electromagnetic induction; micromachining; micromechanical devices; plasma production; wafer bonding; 0.1 to 10 torr; 350 mW; electron temperature; gas pressures; inductively coupled plasma generator; microfabrication; ohmic heating; optical emission spectroscopy; surface micromachining; Argon; Character generation; Circuits; Electrodes; Fabrication; Plasma devices; Plasma sources; Plasma temperature; Power generation; Radio frequency;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.870056
Filename
870056
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