Title :
Application of silicon-based process simulation tools to the fabrication of heterojunction bipolar transistors
Author :
Fields, Charles H. ; Thomas, Stephen, III
Author_Institution :
HRL Labs., Malibu, CA, USA
fDate :
10/1/2000 12:00:00 AM
Abstract :
Process simulation is not widely used to date in the compound semiconductor industry. This is due in part to several issues that exist in applying commercially available simulation tools that were designed for silicon integrated circuits (ICs), to the fabrication of III-V-based devices. These issues arise from the inherent differences in the fabrication techniques used in the separate device technologies. Computer simulations have been applied to model heterojunction bipolar transistor (HBT) fabrication at HRL Laboratories, LLC. These silicon-based simulations require calibration to accurately model the profiles produced during III-V device and IC fabrication. The calibration method includes the production of simulated cross sections, which are then compared with focused ion beam cross sections of actual devices
Keywords :
bipolar integrated circuits; electronic engineering computing; etching; heterojunction bipolar transistors; lithography; semiconductor device metallisation; semiconductor process modelling; surface treatment; technology CAD (electronics); HBT fabrication; HRL Laboratories; IC fabrication; III-V based devices; Si-based process simulation tools; calibration; compound semiconductor device processing; device fabrication; heterojunction bipolar transistors; liftoff patterning; mesa etching; metal deposition; planarization; profile modeling; simulated cross sections; Calibration; Circuit simulation; Computational modeling; Computer simulation; Electronics industry; Fabrication; Heterojunction bipolar transistors; Integrated circuit modeling; Integrated circuit technology; Silicon;
Journal_Title :
Electron Devices, IEEE Transactions on