DocumentCode
1385906
Title
Application of silicon-based process simulation tools to the fabrication of heterojunction bipolar transistors
Author
Fields, Charles H. ; Thomas, Stephen, III
Author_Institution
HRL Labs., Malibu, CA, USA
Volume
47
Issue
10
fYear
2000
fDate
10/1/2000 12:00:00 AM
Firstpage
1973
Lastpage
1979
Abstract
Process simulation is not widely used to date in the compound semiconductor industry. This is due in part to several issues that exist in applying commercially available simulation tools that were designed for silicon integrated circuits (ICs), to the fabrication of III-V-based devices. These issues arise from the inherent differences in the fabrication techniques used in the separate device technologies. Computer simulations have been applied to model heterojunction bipolar transistor (HBT) fabrication at HRL Laboratories, LLC. These silicon-based simulations require calibration to accurately model the profiles produced during III-V device and IC fabrication. The calibration method includes the production of simulated cross sections, which are then compared with focused ion beam cross sections of actual devices
Keywords
bipolar integrated circuits; electronic engineering computing; etching; heterojunction bipolar transistors; lithography; semiconductor device metallisation; semiconductor process modelling; surface treatment; technology CAD (electronics); HBT fabrication; HRL Laboratories; IC fabrication; III-V based devices; Si-based process simulation tools; calibration; compound semiconductor device processing; device fabrication; heterojunction bipolar transistors; liftoff patterning; mesa etching; metal deposition; planarization; profile modeling; simulated cross sections; Calibration; Circuit simulation; Computational modeling; Computer simulation; Electronics industry; Fabrication; Heterojunction bipolar transistors; Integrated circuit modeling; Integrated circuit technology; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.870583
Filename
870583
Link To Document