• DocumentCode
    1385906
  • Title

    Application of silicon-based process simulation tools to the fabrication of heterojunction bipolar transistors

  • Author

    Fields, Charles H. ; Thomas, Stephen, III

  • Author_Institution
    HRL Labs., Malibu, CA, USA
  • Volume
    47
  • Issue
    10
  • fYear
    2000
  • fDate
    10/1/2000 12:00:00 AM
  • Firstpage
    1973
  • Lastpage
    1979
  • Abstract
    Process simulation is not widely used to date in the compound semiconductor industry. This is due in part to several issues that exist in applying commercially available simulation tools that were designed for silicon integrated circuits (ICs), to the fabrication of III-V-based devices. These issues arise from the inherent differences in the fabrication techniques used in the separate device technologies. Computer simulations have been applied to model heterojunction bipolar transistor (HBT) fabrication at HRL Laboratories, LLC. These silicon-based simulations require calibration to accurately model the profiles produced during III-V device and IC fabrication. The calibration method includes the production of simulated cross sections, which are then compared with focused ion beam cross sections of actual devices
  • Keywords
    bipolar integrated circuits; electronic engineering computing; etching; heterojunction bipolar transistors; lithography; semiconductor device metallisation; semiconductor process modelling; surface treatment; technology CAD (electronics); HBT fabrication; HRL Laboratories; IC fabrication; III-V based devices; Si-based process simulation tools; calibration; compound semiconductor device processing; device fabrication; heterojunction bipolar transistors; liftoff patterning; mesa etching; metal deposition; planarization; profile modeling; simulated cross sections; Calibration; Circuit simulation; Computational modeling; Computer simulation; Electronics industry; Fabrication; Heterojunction bipolar transistors; Integrated circuit modeling; Integrated circuit technology; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.870583
  • Filename
    870583