• DocumentCode
    1386051
  • Title

    Si-micromachined coplanar waveguides for use in high-frequency circuits

  • Author

    Herrick, Katherine Juliet ; Schwarz, Thomas A. ; Katehi, Linda P B

  • Author_Institution
    Michigan Univ., Ann Arbor, MI, USA
  • Volume
    46
  • Issue
    6
  • fYear
    1998
  • fDate
    6/1/1998 12:00:00 AM
  • Firstpage
    762
  • Lastpage
    768
  • Abstract
    This paper describes the development and characterization of a new class of Si-micromachined lines and circuit components for operation between 2-110 GHz. In these lines, which are a finite-ground coplanar-waveguide (FGC) type, Si micromachining is used to remove the dielectric material from the aperture regions in an effort to reduce dispersion and minimize propagation loss. Measured results have shown a considerable loss reduction to levels that compare favorably with those of membrane lines and rectangular waveguides. Micromachined FGC lines have been used to develop V- and W-band bandpass filters. The W-band micromachined FGC filter has shown a 0.8-dB improvement in insertion loss at 94 GHz over a conventional FGC line. This approach offers an excellent alternative to the membrane technology, exhibiting very low loss, no dispersion, and mode-free operation without using membranes to support the interconnect structure
  • Keywords
    MIMIC; MMIC; band-pass filters; coplanar waveguides; dispersion (wave); elemental semiconductors; losses; microwave filters; millimetre wave filters; silicon; 2 to 110 GHz; Si; V-band; W-band; bandpass filters; dispersion; finite-ground coplanar-waveguide; high-frequency circuits; insertion loss; loss reduction; micromachined coplanar waveguides; mode-free operation; propagation loss; Apertures; Band pass filters; Biomembranes; Circuits; Coplanar waveguides; Dielectric loss measurement; Dielectric materials; Dielectric measurements; Micromachining; Propagation losses;
  • fLanguage
    English
  • Journal_Title
    Microwave Theory and Techniques, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9480
  • Type

    jour

  • DOI
    10.1109/22.681198
  • Filename
    681198