Investigations of GMR characteristics and crystal structures for Ni 81Fe19/Cu multilayers with Ar ion bombardment on interfaces

Ni₈₁Fe₁₉/Cu multilayers with giant magnetoresistance were deposited by dual ion beam sputtering method, which can control the crystallite orientation and interfacial structure by adjusting preparation conditions. In this study, only a few monolayers at interfaces in Ni₈₁Fe₁₉/Cu multilayers were exposed to ion bombardment to change the interfacial conditions, such as sharp interface, the local mixing and the interfacial diffusion. Ion bombardment to interfaces at restricted acceleration voltage of 160 V and reduction of recoiled Ar incidence seems to be effective for attaining preferable GMR characteristics, where clear interfaces and the best crystallinity seems to be constructed in the multilayers