DocumentCode :
1387771
Title :
Electrochemical Metallization Resistive Memory Devices Using \\hbox {ZnS-SiO}_{2} as a Solid Electrolyte
Author :
Huang, J.Q. ; Shi, L.P. ; Yeo, E.G. ; Yi, K.J. ; Zhao, R.
Author_Institution :
Data Storage Inst., Agency for Sci., Technol. & Res. (A*STAR), Singapore, Singapore
Volume :
33
Issue :
1
fYear :
2012
Firstpage :
98
Lastpage :
100
Abstract :
The high performance of a resistive memory device based on electrochemical metallization is presented. With a solid electrolyte mixture consisting of zinc sulfide and silicon dioxide, the device combines the strengths of pure sulfide and pure oxide electrolytes, and exhibits various attractive characteristics such as forming-free switching, reasonably low currents, and high speed. Bipolar switching with an ON/OFF-state resistance ratio of about 100 is demonstrated by a direct-current quasi-static sweep. Pulse characterization shows that the device can be bistably SET and RESET using square pulses with pulsewidth down to 10 ns. Reliable endurance of 105 cycles and a stable retention time up to 106 s are also achieved.
Keywords :
random-access storage; semiconductor device metallisation; silicon compounds; solid electrolytes; zinc compounds; RESET; ZnS-SiO2; bipolar switching; direct-current quasi-static sweep; electrochemical metallization resistive memory devices; electrolyte mixture; forming-free switching; on-off-state resistance ratio; pure oxide electrolytes; pure sulfide electrolytes; silicon dioxide; solid electrolyte; time 10 ns; zinc sulfide; Copper; Electrodes; Metallization; Performance evaluation; Resistance; Solids; Switches; $hbox{ZnS-SiO}_{2}$; Electrochemical metallization (ECM); resistive memory;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2173457
Filename :
6094165
Link To Document :
بازگشت