DocumentCode :
1392032
Title :
Stacked quantum dot transistor and charge-induced confinement enhancement
Author :
Guo, L. Jay ; Chou, Stephen Y.
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ
Volume :
34
Issue :
10
fYear :
1998
fDate :
5/14/1998 12:00:00 AM
Firstpage :
1030
Lastpage :
1031
Abstract :
A new quantum dot transistor that has a polysilicon dot floating gate stacked on top of a silicon quantum dot channel has been fabricated. It is observed that charging of the floating gate not only shifts the threshold voltage of the quantum dot transistor, but also significantly increases the peak-to-valley ratio and peak separation in the conductance oscillations
Keywords :
semiconductor quantum dots; silicon; single electron transistors; Si; Si quantum dot channel; charge-induced confinement enhancement; conductance oscillations; peak separation; peak-to-valley ratio; polysilicon dot floating gate; stacked quantum dot transistor; threshold voltage shifting;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19980717
Filename :
683000
Link To Document :
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