Title :
Micromachined thick permanent magnet arrays on silicon wafers
Author :
Liakopoulos, Trifon M. ; Zhang, Wenjin ; Ahn, Chong H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
fDate :
9/1/1996 12:00:00 AM
Abstract :
Using micromachining and electroplating techniques, micromachined thick CoNiMnP-based permanent magnet arrays have been designed, fabricated, and characterized for magnetic microelectromechanical systems (MEMS) device applications. The electroplated magnet arrays contain 1,500 magnets of 40 μm×40 μm×50 μm in a cubic shape on the silicon substrate of 2.5 mm×2.5 mm, where the magnets have shown a fairly high magnetic vertical coercivity of 800-1300 Oe, a retentivity of 2.0-3.0 kG, a maximum flux saturation of 12.0-13.0 kG, and a maximum energy density of 14 kJ/m3
Keywords :
arrays; cobalt alloys; coercive force; electroplating; manganese alloys; micromachining; micromechanical devices; nickel alloys; permanent magnets; phosphorus alloys; silicon; CoNiMnP; Si; electroplating; energy density; flux saturation; magnetic microelectromechanical system; magnetic vertical coercivity; micromachining; permanent magnet array; retentivity; silicon wafer; Coercive force; Fabrication; Magnetic anisotropy; Magnetic films; Magnetic flux; Micromechanical devices; Permanent magnets; Perpendicular magnetic anisotropy; Saturation magnetization; Silicon;
Journal_Title :
Magnetics, IEEE Transactions on
