DocumentCode :
1392164
Title :
On-wafer electrooptic probing using rotational deformation modulation
Author :
Chen, W.H. ; Kuo, W.K. ; Huang, S.L. ; Huang, Y.T.
Author_Institution :
Inst. of Electro-Opt. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
Volume :
12
Issue :
9
fYear :
2000
Firstpage :
1228
Lastpage :
1230
Abstract :
On-wafer electrooptic probing of two-dimensional electric-field vector (E-vector) is demonstrated by using one laser beam and one electrooptic prober. This technique utilizes both compressed-stretched deformation and rotational deformation on the index ellipsoid of the electrooptic crystal. Both experiment and simulation were performed to map the E-vector on a circuit board, and the measurement error is within 2.2%.
Keywords :
electro-optical devices; electro-optical modulation; integrated circuit testing; measurement errors; optical polarisers; optical sensors; polarimetry; probes; 2D electric-field vector; E-vector; circuit board; compressed-stretched deformation; electrooptic crystal; index ellipsoid; measurement error; on-wafer electrooptic probing; rotational deformation; rotational deformation modulation; two-dimensional electric-field vector; Antenna measurements; Circuit testing; Crystals; Electric variables measurement; Electrooptic effects; Electrooptic modulators; Ellipsoids; Lasers and electrooptics; Optical modulation; Transmission line measurements;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.874244
Filename :
874244
Link To Document :
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