Title :
A Silicon-Based 3-D Hybrid Long-Range Plasmonic Waveguide for Nanophotonic Integration
Author :
Chen, Lin ; Li, Xun ; Wang, Guoping ; Li, Wei ; Chen, Sihai ; Xiao, Long ; Gao, Dingshan
Author_Institution :
Sch. of Optoelectron. Sci. & Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
Decreasing the widths and thicknesses of thin metal stripes can effectively increase the propagation distance of long-range surface plasmon polaritons, but at the cost of significant reduction on the overall mode confinement, which fundamentally limits the packing density in nanophotonic integration. By utilizing the coupling between the dielectric waveguide and plasmonic modes, we propose a silicon-based 3-D hybrid long-range plasmonic waveguide that not only supports long-range propagation, but also has compact modal size. Our simulation result shows that a propagation distance of 696 μm with an ultrasmall modal area of 0.0013 μm2 can be simultaneously achieved at 1.55 μ m.
Keywords :
elemental semiconductors; nanophotonics; optical waveguides; plasmonics; polaritons; silicon; surface plasmons; Si; compact modal size; dielectric waveguide; long-range propagation; long-range surface plasmon polaritons; mode confinement; nanophotonic integration; packing density; plasmonic modes; propagation distance; silicon-based 3D hybrid long-range plasmonic waveguide; thin metal stripes; wavelength 1.55 mum; Dielectrics; Electromagnetic waveguides; Films; Indexes; Metals; Plasmons; Silicon; Dielectric waveguides; nanophotonics; optical waveguides; plasmons;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2011.2179008