DocumentCode :
1395151
Title :
Edge-coupled InGaAs P-I-N photodiode with a pseudowindow
Author :
Ho, Chong-Long ; Wu, Meng-Chyi ; Ho, Wen-Jeng ; Liaw, Jy-Wang
Author_Institution :
Telecommun. Lab., Chunghwa Telecom Co. Ltd., Taiwan
Volume :
47
Issue :
11
fYear :
2000
fDate :
11/1/2000 12:00:00 AM
Firstpage :
2088
Lastpage :
2092
Abstract :
We have experimentally verified that the incorporation of a pseudowindow with appropriate thickness can be advantageous for avoiding excessive surface leakage and improving quantum efficiency of edge-coupled InP/InGaAs/InP p-i-n photodiode (EC-PD). The window, which results in a passive facet, effectively protects the diode during facet cleavage and facet coating. Typical leakage density at -5 V of a facet-coated EC-PD with 2-μm pseudowindow is lower than 1.5×10 -6 A/cm2 (30 pA). Also, due to the dielectric layers and the absence of alloyed metal/semiconductor interface on top of the window, the EC-PD could have an enlarged coupling aperture and reduced dissipative absorption. Nevertheless, for low-bias operation (e.g., ⩽5 V), window thickness should be accurately controlled, otherwise excessive absorption in undepleted region would degrade the device performance. The optimal window thickness, which in fact is affected by experimental parameters (e.g., diffusion time), was determined to be about 2 to 3 μm in this study according to the measurement results of efficiency and bandwidth
Keywords :
III-V semiconductors; dark conductivity; diffusion; indium compounds; optical receivers; p-i-n photodiodes; semiconductor device reliability; -5 V; 2 to 3 micron; InP-InGaAs-InP; diffusion time; dissipative absorption; edge-coupled P-I-N photodiode; enlarged coupling aperture; facet cleavage; facet coating; leakage density; low-bias operation; optimal window thickness; passive facet; pseudowindow; quantum efficiency; surface leakage; undepleted region; Absorption; Apertures; Coatings; Dielectrics; Indium gallium arsenide; Indium phosphide; P-i-n diodes; PIN photodiodes; Protection; Semiconductor diodes;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.877170
Filename :
877170
Link To Document :
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