Reactive gas-controlled arc process

Author

Rogozin, Alexander F. ; Fontana, Raymond P.

Author_Institution

Multi-Arc Inc., Rockaway, NJ, USA

Volume

25

Issue

4

fYear

1997

fDate

8/1/1997 12:00:00 AM

Firstpage

680

Lastpage

684

Abstract

A method to reduce macroparticles, increase the deposition rate, and improve the coating quality in the cathodic vacuum arc deposition process is suggested. This method is based on the creation of emission-active phases on the cathode surface, and changing the melting point of surface layers of the cathode material and its work function. TiN coatings with a surface roughness of about 0.02 μm and microhardness H_V about 4000 were deposited (compared with 0.085 μm Ra and 2900 H_V for the conventional process). The method was successfully employed for the deposition of smooth coatings of AlN, (Ti,Al)N, and other compounds

Keywords

microhardness; plasma applications; plasma deposited coatings; plasma deposition; vacuum arcs; vacuum deposition; work function; (Ti,Al)N; (TiAl)N; AlN; TiN; TiN coatings; cathode material; cathode surface; cathodic vacuum arc deposition; coating quality; deposition rate; emission-active phases; macroparticles; melting point; microhardness; reactive gas-controlled arc process; smooth coating deposition; surface layers; surface roughness; work function; Cathodes; Coatings; Electrons; Plasma chemistry; Plasma sources; Plasma temperature; Rough surfaces; Spectroscopy; Surface roughness; Vacuum arcs;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.640685

Filename

640685