DocumentCode :
1396033
Title :
Fabrication of size-tunable Cr nanodots and nanorings array by modified nanosphere lithography
Author :
Hung-Chun Wu ; Chien, Hsi-hsin ; Kung-Jeng Ma ; Ming-Dong Bao
Author_Institution :
Coll. of Eng., Chung Hua Univ., Hsinchu, Taiwan
Volume :
7
Issue :
10
fYear :
2012
fDate :
10/1/2012 12:00:00 AM
Firstpage :
1056
Lastpage :
1059
Abstract :
This Letter is devoted to developing a novel and low-cost strategy for fabricating Cr triangular-shaped nanodot and nanoring array patterns by a distinct magnetron sputtering approach using nanosphere lithography-based technology. The size of polystyrene nanospheres had a direct influence on the size and period of Cr nanorings. The lateral sizes, inner sizes, wall thickness and wall height are controllable by varying the process conditions of reactive ion etching, magnetron sputtering and the lift-off process. The wettability can be manipulated by changing the size of the nanorings. This new approach will surely facilitate further exploration of metal nanorings for potential applications in electro-optic devices.
Keywords :
chromium; nanofabrication; nanolithography; nanopatterning; nanoporous materials; polymers; porosity; sputter deposition; sputter etching; wetting; Cr; chromium thin films; electro-optic devices; inner size; lateral size; lift-off process; magnetron sputtering; modified nanosphere lithography-based technology; nanoring array; polystyrene nanosphere size; porous chromium nanoring period; porous chromium nanoring size; reactive ion etching; size tunable chromium nanodots; wall height; wall thickness; wettability;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2012.0636
Filename :
6407216
Link To Document :
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