DocumentCode :
1396213
Title :
Through-Silicon Photonic Via and Unidirectional Coupler for High-Speed Data Transmission in Optoelectronic Three-Dimensional LSI
Author :
Noriki, Akihiro ; Lee, Kangwook ; Bea, Jicheol ; Fukushima, Takafumi ; Tanaka, Tetsu ; Koyanagi, Mitsumasa
Author_Institution :
Bioeng. & Robot., Tohoku Univ., Sendai, Japan
Volume :
33
Issue :
2
fYear :
2012
Firstpage :
221
Lastpage :
223
Abstract :
We develop Si-core through-silicon photonic via (TSPV) and unidirectional coupler for low-loss and high-speed data transmission in an optoelectronic 3-D LSI. The TSPVs, comprising a Si-core and SiO2 cladding, were fabricated simultaneously with Cu TSVs. The characteristics of light confinement of the TSPV were measured using a near-field pattern measurement. The spot light area was well confined within the TSPV without interference from the lights. The optical intensity that passed through the TSPV was 20% higher than that which passed through the Si substrate. The unidirectional optical coupler with two mirrors showed higher coupling efficiency. Laser light can be efficiently propagated to a planar Si waveguide through the TSPV and the unidirectional coupler.
Keywords :
copper; integrated optoelectronics; mirrors; optical couplers; optical interconnections; optical waveguides; silicon; silicon compounds; coupling efficiency; high-speed data transmission; light confinement; mirrors; near-field pattern measurement; optical intensity; optoelectronic three-dimensional LSI; spot light area was; through-silicon photonic via; unidirectional optical coupler; Couplers; High speed optical techniques; Large scale integration; Mirrors; Optical coupling; Optical interconnections; Silicon; Coupling efficiency; near-field pattern (NFP); optical coupler; optoelectronic 3-D LSI; through-silicon photonic via (TSPV);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2174608
Filename :
6101553
Link To Document :
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