DocumentCode :
1396299
Title :
Electrothermal Access Resistance Model for GaN-Based HEMTs
Author :
Thorsell, Mattias ; Andersson, Kristoffer ; Hjelmgren, Hans ; Rorsman, Niklas
Author_Institution :
Microwave Electron. Lab., Chalmers Univ. of Technol., Göteborg, Sweden
Volume :
58
Issue :
2
fYear :
2011
Firstpage :
466
Lastpage :
472
Abstract :
The high-power density in GaN-based high-electron-mobility transistors (HEMTs) increases demands on the accurate extraction and modeling of electrothermal effects such as self-heating. This paper presents a new electrothermal model of the access resistances in GaN HEMTs, taking into account both self heating and bias dependence. A coplanar ungated transfer length method (TLM) structure has been used to extract the resistance versus temperature, bias, and RF power. The temperature dependence is extracted from dc measurements at ambient temperatures between 293 and 443 K. Small-signal measurements are used to extract the time constants in the thermal impedance. The bias dependence of the current is characterized by isothermal large-signal RF measurements between 1 and 6 GHz. A new method for extracting the thermal resistance from the large-signal measurements together with temperature-dependent dc measurements is also presented.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; semiconductor device models; thermal resistance; wide band gap semiconductors; GaN; HEMT; coplanar ungated transfer length method structure; dc measurements; electrothermal access resistance model; high-electron-mobility transistors; self-heating; temperature 293 K to 443 K; thermal impedance; Current measurement; Electrical resistance measurement; HEMTs; MODFETs; Resistance; Temperature dependence; Temperature measurement; Electrothermal effects; gallium nitride (GaN); high-electron-mobility transistors (HEMTs); nonlinear network analysis; resistance; semiconductor device modeling; thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2093012
Filename :
5659469
Link To Document :
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