DocumentCode :
1398650
Title :
Submicrometer-Thick Low-Loss As 
S 
Planar Waveguides for Nonlinear Optical Devices
Author :
Choi, D.-Y. ; Madden, S. ; Bulla, D.A. ; Wang, R. ; Rode, A. ; Luther-Davies, B.
Author_Institution :
Centre for Ultrahigh-Bandwidth Devices for Opt. Syst. (CUDOS), Australian Nat. Univ., Canberra, ACT, Australia
Volume :
22
Issue :
7
fYear :
2010
fDate :
4/1/2010 12:00:00 AM
Firstpage :
495
Lastpage :
497
Abstract :
We describe a fabrication process for and the characterization of submicrometer-thick As2S3 waveguides. Poly(methylmethacrylate) and bottom antireflective coating were employed as thin protective layers prior to photoresist patterning in order to prevent the attack of the As2S3 film by an alkaline developer. Propagation losses of ~0.2 and 0.6 dB/cm were measured for 4- and 2-??m-wide waveguides fabricated from 0.85-??m-thick films. Slightly higher loss in the transverse-magnetic mode may be the result of surface scattering of the rougher etched sidewalls.
Keywords :
antireflection coatings; arsenic compounds; chalcogenide glasses; nonlinear optics; optical fabrication; optical films; optical losses; optical planar waveguides; photoresists; surface scattering; As2S3; alkaline developer; bottom antireflective coating; nonlinear optical devices; photoresist patterning; poly(methylmethacrylate); propagation loss; size 0.85 mum; submicrometer-thick low-loss planar waveguides; surface scattering; thin protective layers; transverse-magnetic mode; waveguide fabrication; Amorphous semiconductors; fabrication; nonlinear optic devices; optical waveguides;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2010.2040170
Filename :
5401068
Link To Document :
