DocumentCode
1399486
Title
A Highly Scalable Interface Fuse for Advanced CMOS Logic Technologies
Author
Yang, Li-Yu ; Hsieh, Min-Che ; Liu, Jheng-Sin ; Chin, Yung-Wen ; Lin, Chrong Jung
Author_Institution
Inst. of Electron. Eng., Nat. Tsing-Hua Univ., Hsinchu, Taiwan
Volume
33
Issue
2
fYear
2012
Firstpage
245
Lastpage
247
Abstract
In this letter, we propose a novel interface fuse (iFuse) for low-power electrically programmable fuses in advanced CMOS applications. With an offset-landed metal-to-contact or contact-to-polysilicon structure, the iFuse can be programmed by substantially reduced current as compared to conventional fuses. A diagonal contact layout and the optical pattern correction scheme can further improve the cell stability as well as its programming characteristics.
Keywords
CMOS logic circuits; programmable logic arrays; CMOS logic technology; contact-to-polysilicon structure; diagonal contact layout; highly scalable interface fuse; iFuse; low power electrically programmable fuse; offset landed metal-to-contact; optical pattern correction; CMOS integrated circuits; CMOS technology; Fuses; Layout; Metals; Programming; Resistance; Electrically programmable; fuse; metal–contact interface;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2011.2175696
Filename
6104353
Link To Document