• DocumentCode
    1399818
  • Title

    An analytical drain current model for submicrometer and deep submicrometer MOSFET´s

  • Author

    Jang, Sheng-Lyang ; Hu, Man-chun

  • Author_Institution
    Dept. of Electron. Eng., Nat. Taiwan Inst. of Technol., Taipei, Taiwan
  • Volume
    44
  • Issue
    11
  • fYear
    1997
  • fDate
    11/1/1997 12:00:00 AM
  • Firstpage
    1896
  • Lastpage
    1902
  • Abstract
    In this paper, we present a new, analytical, and physics-based drain current model for both submicrometer and deep submicrometer MOSFET´s. The model was developed by starting from a two-dimensional (2D) Poisson equation and using the energy balance equation. Using the present model, we can clearly see that the drain current increases with decreasing channel length due to a larger average channel mobility at shorter channel length. The formulas for the saturation drain voltage and the drain current can be reduced to their corresponding well-known formulas in the submicrometer range. The accuracy of the presented model has been verified with the experimental data of metal-oxide-semiconductor (MOS) devices with various geometries
  • Keywords
    MOSFET; carrier mobility; electric current; semiconductor device models; 2D Poisson equation; analytical drain current model; channel length; channel mobility; deep submicron MOSFET; energy balance equation; physics-based model; saturation drain voltage; submicrometer MOSFETs; Analytical models; Electrons; Hydrodynamics; MOSFET circuits; Poisson equations; Power engineering and energy; Semiconductor device modeling; Temperature; Ultra large scale integration; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.641358
  • Filename
    641358